文献
J-GLOBAL ID:201702245858991929
整理番号:17A0749551
層状構造ビスマスアンチモンテルリド熱電膜のvan der Waalsエピタクシーのためのグラフェン基板【Powered by NICT】
Graphene Substrate for van der Waals Epitaxy of Layer-Structured Bismuth Antimony Telluride Thermoelectric Film
著者 (7件):
Kim Eun Sung
(Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS), Sungkyunkwan University, Suwon, 16419, Republic of Korea)
,
Hwang Jae-Yeol
(Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS), Sungkyunkwan University, Suwon, 16419, Republic of Korea)
,
Lee Kyu Hyoung
(Department of Nano Applied Engineering, Kangwon National University, Chuncheon, 24341, Republic of Korea)
,
Ohta Hiromichi
(Research Institute for Electronic Science, Hokkaido University, N20W10, Kita, Sapporo, 001-0020, Japan)
,
Lee Young Hee
(Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS), Sungkyunkwan University, Suwon, 16419, Republic of Korea)
,
Lee Young Hee
(Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea)
,
Kim Sung Wng
(Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea)
資料名:
Advanced Materials
(Advanced Materials)
巻:
29
号:
8
ページ:
ROMBUNNO.201604899
発行年:
2017年
JST資料番号:
W0001A
ISSN:
0935-9648
CODEN:
ADVMEW
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)