文献
J-GLOBAL ID:201702245934691144
整理番号:17A1007026
水素ラジカルを用いたフォトレジスト除去速度の圧力依存性
Pressure Dependence of Photoresist Removal Rate Using Hydrogen Radicals
著者 (9件):
Yamamoto Masashi
(Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College)
,
Shiroi Tomohiro
(Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College)
,
Nagaoka Shiro
(Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College)
,
Shikama Tomokazu
(Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College)
,
Umemoto Hironobu
(Graduate School of Integrated Science and Technology, Shizuoka University)
,
Ohdaira Keisuke
(Japan Advanced Institute of Science and Technology)
,
Takagi Seiji
(Graduate School of Engineering, Osaka City University)
,
Nishiyama Takashi
(Graduate School of Engineering, Osaka City University)
,
Horibe Hideo
(Graduate School of Engineering, Osaka City University)
資料名:
Journal of Photopolymer Science and Technology
(Journal of Photopolymer Science and Technology)
巻:
30
号:
3
ページ:
297-301(J-STAGE)
発行年:
2017年
JST資料番号:
L0202A
ISSN:
0914-9244
CODEN:
JSTEEW
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
日本 (JPN)
言語:
英語 (EN)