文献
J-GLOBAL ID:201702248075892220
整理番号:17A0407461
プラズマ損傷の自由であることの対向ターゲットスパッタリングによるグラフェン底部電極上に蒸着した大面積薄膜キャパシタ【Powered by NICT】
Large-area thin-film capacitors deposited onto graphene bottom electrodes via facing-target sputtering that is free of plasma damage
著者 (4件):
Kim Jae-Hee
(Department of Materials Science and Engineering, Chungnam National University, Daeduk Science Town, 34143, Daejeon, South Korea)
,
Park Byeong-Ju
(Department of Materials Science and Engineering, Chungnam National University, Daeduk Science Town, 34143, Daejeon, South Korea)
,
Eom Ji-Ho
(Department of Materials Science and Engineering, Chungnam National University, Daeduk Science Town, 34143, Daejeon, South Korea)
,
Yoon Soon-Gil
(Department of Materials Science and Engineering, Chungnam National University, Daeduk Science Town, 34143, Daejeon, South Korea)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
695
ページ:
2886-2893
発行年:
2017年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)