文献
J-GLOBAL ID:201702248099182078
整理番号:17A0492873
暗電流抑制のための誘電体超薄膜を用いた横方向アモルファスセレン金属-絶縁体-半導体-絶縁体-金属光検出器
Lateral amorphous selenium metal-insulator-semiconductor-insulator-metal photodetectors using ultrathin dielectric blocking layers for dark current suppression
著者 (6件):
Chang Cheng-Yi
(Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 30010, Taiwan)
,
Pan Fu-Ming
(Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 30010, Taiwan)
,
Lin Jian-Siang
(Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 30010, Taiwan)
,
Yu Tung-Yuan
(National Nano Device Laboratories, No. 26, Prosperity Road I, Hsinchu Science Park, Hsinchu 30078 Taiwan)
,
Li Yi-Ming
(Department of Electrical Engineering, National Chiao-Tung University, Hsinchu 30010 Taiwan)
,
Chen Chieh-Yang
(Department of Electrical Engineering, National Chiao-Tung University, Hsinchu 30010 Taiwan)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
120
号:
23
ページ:
234501-234501-8
発行年:
2016年12月21日
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)