文献
J-GLOBAL ID:201702248385709396
整理番号:17A0406911
誘電体薄膜挿入によるA LD ZnOベース整流構造の特性の調整-モデル化と実験的研究【Powered by NICT】
Tuning the properties of ALD-ZnO-based rectifying structures by thin dielectric film insertion - Modeling and experimental studies
著者 (8件):
Krajewski Tomasz A.
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
,
Smertenko Petro S.
(Institute of Semiconductor Physics, National Academy of Sciences of Ukraine (NASU), Prosp. Nauki 45, 03028, Kyiv, Ukraine)
,
Luka Grzegorz
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
,
Snigurenko Dymitr
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
,
Kopalko Krzysztof
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
,
Lusakowska Elzbieta
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
,
Jakiela Rafal
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
,
Guziewicz Elzbieta
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668, Warsaw, Poland)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
693
ページ:
1164-1173
発行年:
2017年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)