文献
J-GLOBAL ID:201702249147348663
整理番号:17A0445355
ヘキサメチルジシラザンまたはビニルトリメチルシランと酸素プラズマ処理を用いた低温プラズマ増強化学蒸着で作製したSiOx含有硬質膜の特性【Powered by NICT】
Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment
著者 (5件):
Wei Yi-Syuan
(Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan)
,
Liu Wan-Yu
(Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan)
,
Wu Hsin-Ming
(Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan)
,
Chen Ko-Shao
(Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan)
,
Cech Vladimir
(Institute of Materials Chemistry, Brno University of Technology, Czechia)
資料名:
Materials Chemistry and Physics
(Materials Chemistry and Physics)
巻:
189
ページ:
183-190
発行年:
2017年
JST資料番号:
E0934A
ISSN:
0254-0584
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)