文献
J-GLOBAL ID:201702249400887690
整理番号:17A0407082
523Kでのマグネトロンスパッタリングを用いて蒸着したCo-N薄膜の構造と磁気的性質【Powered by NICT】
Structural and magnetic properties of Co-N thin films deposited using magnetron sputtering at 523 K
著者 (8件):
Pandey Nidhi
(UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore, 452 001, India)
,
Gupta Mukul
(UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore, 452 001, India)
,
Gupta Rachana
(Institute of Engineering and Technology DAVV, Khandwa Road, Indore, 452 017, India)
,
Chakravarty Sujay
(UGC-DAE Consortium for Scientific Research, Kalpakkam Node, Kokilamedu, 603 104, Tamilnadu, India)
,
Shukla Neeraj
(UGC-DAE Consortium for Scientific Research, Kalpakkam Node, Kokilamedu, 603 104, Tamilnadu, India)
,
Devishvili Anton
(Institut Laue-Langevin, rue des Martyrs, 38042, Grenoble Cedex, France)
,
Devishvili Anton
(Division of Physical Chemistry, Department of Chemistry, Lund University, 124, Lund, S221 00, Sweden)
,
Devishvili Anton
(Department of Physics & Astronomy, Uppsala University, Box 530, SE-75121, Uppsala, Sweden)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
694
ページ:
1209-1213
発行年:
2017年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)