文献
J-GLOBAL ID:201702249518794004
整理番号:17A0443975 高出力インパルスマグネトロンスパッタリングにおける小孔の内壁上の(Ti, Al)N膜成長の圧力依存性【Powered by NICT】
Pressure dependence of (Ti, Al)N film growth on inner walls of small holes in high-power impulse magnetron sputtering
著者 (6件): Shimizu Tetsuhide
(Division of Intelligent Mechanical Systems, Graduate School of System Design, Tokyo Metropolitan University, 6-6, Asahigaoka, Hino-shi, 191-0065 Tokyo, Japan)
,
Komiya Hidetoshi
(Surface Finishing Technology Group, Tokyo Metropolitan Industrial Technology Research Institute, 2-4-10, Aomi, Kohtoh-ku, 135-0064 Tokyo, Japan)
,
Teranishi Yoshikazu
(Surface Finishing Technology Group, Tokyo Metropolitan Industrial Technology Research Institute, 2-4-10, Aomi, Kohtoh-ku, 135-0064 Tokyo, Japan)
,
Morikawa Kazuo
(Surface Finishing Technology Group, Tokyo Metropolitan Industrial Technology Research Institute, 2-4-10, Aomi, Kohtoh-ku, 135-0064 Tokyo, Japan)
,
Nagasaka Hiroshi
(Surface Finishing Technology Group, Tokyo Metropolitan Industrial Technology Research Institute, 2-4-10, Aomi, Kohtoh-ku, 135-0064 Tokyo, Japan)
,
Yang Ming
(Division of Intelligent Mechanical Systems, Graduate School of System Design, Tokyo Metropolitan University, 6-6, Asahigaoka, Hino-shi, 191-0065 Tokyo, Japan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
624
ページ:
189-196
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)