文献
J-GLOBAL ID:201702252676146634
整理番号:17A1447615
CdS/シリコンナノスクリューフォトレジスタの作製と光感度【Powered by NICT】
Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor
著者 (6件):
Liu Jing
(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China)
,
Yi Futing
(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China)
,
Zhou Yue
(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China)
,
Wang Bo
(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China)
,
Zhang Tianchong
(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China)
,
Wang Yuting
(Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China)
資料名:
Chemistryselect
(Chemistryselect)
巻:
2
号:
27
ページ:
8577-8582
発行年:
2017年
JST資料番号:
W2528A
ISSN:
2365-6549
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)