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J-GLOBAL ID:201702253086283816
整理番号:17A0825202
HfO_2~-不動態化した黒リントランジスタに及ぼす総電離線量効果【Powered by NICT】
Total Ionizing Dose Effects on HfO2-Passivated Black Phosphorus Transistors
著者 (8件):
Liang C.
(Electrical Engineering and Computer Science Department, Vanderbilt University, Nashville, TN, USA)
,
Su Y.
(Electrical Engineering and Computer Science Department, University of Minnesota, Minneapolis, MN, USA)
,
Zhang E. X.
(Electrical Engineering and Computer Science Department, Vanderbilt University, Nashville, TN, USA)
,
Ni K.
(Electrical Engineering and Computer Science Department, Vanderbilt University, Nashville, TN, USA)
,
Alles M. L.
(Electrical Engineering and Computer Science Department, Vanderbilt University, Nashville, TN, USA)
,
Schrimpf R. D.
(Electrical Engineering and Computer Science Department, Vanderbilt University, Nashville, TN, USA)
,
Fleetwood D. M.
(Electrical Engineering and Computer Science Department, Vanderbilt University, Nashville, TN, USA)
,
Koester S. J.
(Electrical Engineering and Computer Science Department, University of Minnesota, Minneapolis, MN, USA)
資料名:
IEEE Transactions on Nuclear Science
(IEEE Transactions on Nuclear Science)
巻:
64
号:
1
ページ:
170-175
発行年:
2017年
JST資料番号:
C0235A
ISSN:
0018-9499
CODEN:
IETNAE
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)