文献
J-GLOBAL ID:201702253345729335
整理番号:17A0946051
均一で垂直および深いシリコン構造の金属アシスト化学エッチング法の改良
Improved metal assisted chemical etching method for uniform, vertical and deep silicon structure
著者 (9件):
MIAO Bin
(Suzhou Inst. of Nano-tech and Nano-bionics, Chinese Acad. of Sci., Suzhou, CHN)
,
ZHANG Jian
(Suzhou Inst. of Nano-tech and Nano-bionics, Chinese Acad. of Sci., Suzhou, CHN)
,
DING Xiangzhen
(Suzhou Inst. of Nano-tech and Nano-bionics, Chinese Acad. of Sci., Suzhou, CHN)
,
DING Xiangzhen
(Univ. Chinese Acad. of Sci., Beijing, CHN)
,
WU Dongmin
(Suzhou Inst. of Nano-tech and Nano-bionics, Chinese Acad. of Sci., Suzhou, CHN)
,
WU Yihui
(Changchun Inst. of Optics Fine Mechanics and Physics, Chinese Acad. of Sci., Changchun, CHN)
,
LU Wenhui
(Huzhou Univ., Huzhou, CHN)
,
LI Jiadong
(Suzhou Inst. of Nano-tech and Nano-bionics, Chinese Acad. of Sci., Suzhou, CHN)
,
LI Jiadong
(Changchun Inst. of Optics Fine Mechanics and Physics, Chinese Acad. of Sci., Changchun, CHN)
資料名:
Journal of Micromechanics and Microengineering
(Journal of Micromechanics and Microengineering)
巻:
27
号:
5
ページ:
055019,1-5
発行年:
2017年05月
JST資料番号:
W1424A
ISSN:
0960-1317
CODEN:
JMMIEZ
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)