文献
J-GLOBAL ID:201702253696229579
整理番号:17A0791730
Ni(V)/Al多層膜の反応経路に対する低および高加熱速度の影響【Powered by NICT】
Effect of low and high heating rates on reaction path of Ni(V)/Al multilayer
著者 (5件):
Maj Lukasz
(Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland)
,
Morgiel Jerzy
(Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland)
,
Szlezynger Maciej
(Institute of Metallurgy and Materials Science, Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland)
,
Bala Piotr
(AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, 30 Kawiory St., 30-055 Krakow, Poland)
,
Cios Grzegorz
(AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, 30 Kawiory St., 30-055 Krakow, Poland)
資料名:
Materials Chemistry and Physics
(Materials Chemistry and Physics)
巻:
193
ページ:
244-252
発行年:
2017年
JST資料番号:
E0934A
ISSN:
0254-0584
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)