文献
J-GLOBAL ID:201702256256528343
整理番号:17A0452159
望ましい濃度を用いた高純度H_2O_2の直接合成のためのH_2/O_2プラズマ反応の選択性制御【Powered by NICT】
Selectivity control of H2/O2 plasma reaction for direct synthesis of high purity H2O2 with desired concentration
著者 (10件):
Yi Yanhui
(State Key Laboratory of Fine Chemicals, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Xu Chao
(Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L693GJ, UK)
,
Wang Li
(State Key Laboratory of Fine Chemicals, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Yu Juan
(State Key Laboratory of Fine Chemicals, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Zhu Quanren
(State Key Laboratory of Fine Chemicals, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Sun Shuaiqi
(State Key Laboratory of Fine Chemicals, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Tu Xin
(Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L693GJ, UK)
,
Meng Changgong
(School of Chemistry, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Zhang Jialiang
(School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
,
Guo Hongchen
(State Key Laboratory of Fine Chemicals, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, Liaoning, China)
資料名:
Chemical Engineering Journal
(Chemical Engineering Journal)
巻:
313
ページ:
37-46
発行年:
2017年
JST資料番号:
D0723A
ISSN:
1385-8947
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)