文献
J-GLOBAL ID:201702256920463404
整理番号:17A0040524
エレクトロクロミックデバイスに用いる多孔性ナノ結晶酸化スズ(IV)膜の製造のための低温プロセス
Low-temperature Process for Fabrication of Porous Nanocrystalline Tin(IV) Oxide Film for Electrochromic Devices
著者 (10件):
Horiuchi Tamotsu
(System Device Development Department, Ricoh Institute of Future Technology, Ricoh Company Limited)
,
Horiuchi Tamotsu
(Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology)
,
Yutani Keiichiro
(System Device Development Department, Ricoh Institute of Future Technology, Ricoh Company Limited)
,
Inoue Mamiko
(System Device Development Department, Ricoh Institute of Future Technology, Ricoh Company Limited)
,
Yashiro Tohru
(System Device Development Department, Ricoh Institute of Future Technology, Ricoh Company Limited)
,
Yoshioka Shinji
(System Device Development Department, Ricoh Institute of Future Technology, Ricoh Company Limited)
,
Uchida Satoshi
(Komaba Organization for Educational Excellence (KOMEX), College of Arts and Sciences, The University of Tokyo)
,
Hirotani Daisuke
(Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology)
,
Ogomi Yuhei
(Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology)
,
Hayase Shuji
(Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology)
資料名:
Chemistry Letters
(Chemistry Letters)
巻:
45
号:
7
ページ:
714-716(J-STAGE)
発行年:
2016年
JST資料番号:
S0742A
ISSN:
0366-7022
CODEN:
CMLTAG
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
日本 (JPN)
言語:
英語 (EN)