文献
J-GLOBAL ID:201702259252079968
整理番号:17A0313449
パルスレーザ蒸着により作製した(AlGa)_2O_3薄膜の特性に及ぼす基板温度の影響【Powered by NICT】
Influence of substrate temperature on the properties of (AlGa)2O3 thin films prepared by pulsed laser deposition
著者 (7件):
Wang Xu
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
,
Chen Zhengwei
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
,
Zhang Fabi
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
,
Saito Katsuhiko
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
,
Tanaka Tooru
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
,
Nishio Mitsuhiro
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
,
Guo Qixin
(Department of Electrical and Electronic Engineering, Synchrotron Light Application Center, Saga University, Saga 840-8502, Japan)
資料名:
Ceramics International
(Ceramics International)
巻:
42
号:
11
ページ:
12783-12788
発行年:
2016年08月15日
JST資料番号:
H0705A
ISSN:
0272-8842
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)