文献
J-GLOBAL ID:201702259356475888
整理番号:17A1421105
シラザン前駆体を用いたプラズマ増強化学蒸着で作ったSiC_xN_y膜の光学的性質【Powered by NICT】
Optical properties of plasma-enhanced chemical vapor deposited SiCxNy films by using silazane precursors
著者 (3件):
Chang Wei-Yuan
(Department of Materials Science and Engineering, National Chiao Tung University, 1001 University Road, Hsinchu 30010, Taiwan)
,
Chang Chieh-Yu
(Department of Materials Science and Engineering, National Chiao Tung University, 1001 University Road, Hsinchu 30010, Taiwan)
,
Leu Jihperng
(Department of Materials Science and Engineering, National Chiao Tung University, 1001 University Road, Hsinchu 30010, Taiwan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
636
ページ:
671-679
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)