文献
J-GLOBAL ID:201702260407335410
整理番号:17A1481684
CsI:Tl薄膜の配向性に及ぼす成膜過程と蒸着速度の効果に関する研究【Powered by NICT】
Study on the effect of film formation process and deposition rate on the orientation of the CsI:Tl thin film
著者 (8件):
Tan Xiaochuan
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Liu Shuang
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Xie Yijun
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Guo Lina
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Ma Shijun
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Wang Tianyu
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Liu Yong
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, Chengdu 610054, China)
,
Zhong Zhiyong
(University of Electronic Science and Technology of China, State Key Laboratory of Electronic Thin Films and Integrated Devices, Chengdu 610054, China)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
476
ページ:
64-68
発行年:
2017年
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)