文献
J-GLOBAL ID:201702263339673191
整理番号:17A0375110
後セレン化したCu(In,Ga)Se_2薄膜に及ぼす表面改質Mo裏面接触の影響【Powered by NICT】
Influence of surface-modified Mo back contact on post-selenized Cu(In,Ga)Se2 thin films
著者 (5件):
Huang Yunxiang
(Key Laboratory of Surface Functional Structure Manufacturing of Guangdong Higher Education Institutes, South China University of Technology, Guangzhou 510640, China)
,
Tang Yong
(Key Laboratory of Surface Functional Structure Manufacturing of Guangdong Higher Education Institutes, South China University of Technology, Guangzhou 510640, China)
,
Yuan Wei
(Key Laboratory of Surface Functional Structure Manufacturing of Guangdong Higher Education Institutes, South China University of Technology, Guangzhou 510640, China)
,
Wang Qinghui
(Key Laboratory of Surface Functional Structure Manufacturing of Guangdong Higher Education Institutes, South China University of Technology, Guangzhou 510640, China)
,
Zhang Shiwei
(Key Laboratory of Surface Functional Structure Manufacturing of Guangdong Higher Education Institutes, South China University of Technology, Guangzhou 510640, China)
資料名:
Materials Science in Semiconductor Processing
(Materials Science in Semiconductor Processing)
巻:
57
ページ:
227-232
発行年:
2017年
JST資料番号:
W1055A
ISSN:
1369-8001
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)