文献
J-GLOBAL ID:201702263933130688
整理番号:17A0399715
プラズマ支援分子ビームエピタクシーにより成長させた半極性(20 <span style=text-decoration:overline>2</span> 1)および非極性(10 <span style=text-decoration:overline>1</span> 0)InGaNへのインジウム取り込み【Powered by NICT】
Indium incorporation in semipolar ( 20 <span style=text-decoration:overline>2</span> 1 ) and nonpolar ( 10 <span style=text-decoration:overline>1</span> 0 ) InGaN grown by plasma assisted molecular beam epitaxy
著者 (10件):
Sawicka M.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Sawicka M.
(TopGaN Sp. z o.o., Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Feduniewicz-Zmuda A.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Krysko M.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Turski H.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Muziol G.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Siekacz M.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Wolny P.
(Paul-Drude-Institut fuer Festkorperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany)
,
Skierbiszewski C.
(Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Poland)
,
Skierbiszewski C.
(TopGaN Sp. z o.o., Sokolowska 29/37, 01-142 Warsaw, Poland)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
459
ページ:
129-134
発行年:
2017年
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)