文献
J-GLOBAL ID:201702264010499723
整理番号:17A0446183
滑らかに制御された組成を持つ高速反応性H iPIMSによって作製したHf-O-N薄膜の構造と性質【Powered by NICT】
Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition
著者 (7件):
Belosludtsev A.
(Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czechia)
,
Houska J.
(Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czechia)
,
Vlcek J.
(Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czechia)
,
Haviar S.
(Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czechia)
,
Cerstvy R.
(Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czechia)
,
Rezek J.
(Department of Physics and NTIS - European Centre of Excellence, University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czechia)
,
Kettner M.
(Faculty of Mathematics and Physics, Department of Surface and Plasma Science, Charles University, V Holesovickach 2, Praha 8, 180 00, Czechia)
資料名:
Ceramics International
(Ceramics International)
巻:
43
号:
7
ページ:
5661-5667
発行年:
2017年
JST資料番号:
H0705A
ISSN:
0272-8842
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)