文献
J-GLOBAL ID:201702266892839347
整理番号:17A1444736
シリコンウエハ上の直接Microrolling処理【Powered by NICT】
Direct Microrolling Processing on a Silicon Wafer
著者 (8件):
Aoki Kanna
(Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe, Hyogo, 657-8501, Japan)
,
Ishiguro Keita
(Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe, Hyogo, 657-8501, Japan)
,
Denokami Masaki
(Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe, Hyogo, 657-8501, Japan)
,
Tanahashi Yuya
(Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe, Hyogo, 657-8501, Japan)
,
Furusawa Kentaro
(Frontier Research Laboratory, National Institute of Information and Communications Technology, 4-2-1 Nukui-Kitamachi, Koganei, Tokyo, 184-8795, Japan)
,
Sekine Norihiko
(Frontier Research Laboratory, National Institute of Information and Communications Technology, 4-2-1 Nukui-Kitamachi, Koganei, Tokyo, 184-8795, Japan)
,
Adschiri Tadafumi
(World Premier International Research Center-Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan)
,
Fujii Minoru
(Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe, Hyogo, 657-8501, Japan)
資料名:
Small
(Small)
巻:
13
号:
36
ページ:
ROMBUNNO.201701630
発行年:
2017年
JST資料番号:
W2348A
ISSN:
1613-6810
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)