文献
J-GLOBAL ID:201702267207514661
整理番号:17A1125359
C-V測定を用いたNbドープZnO薄膜トランジスタの状態のサブバンドギャップ密度の抽出【Powered by NICT】
Extraction of the sub-band gap density of states of Nb doped ZnO thin film transistors using C-V measurements
著者 (6件):
Shaw A.
(Department of Electrical Engineering and Electronic, University of Liverpool, L69 3GJ, United Kingdom)
,
Jin J.D.
(Department of Electrical Engineering and Electronic, University of Liverpool, L69 3GJ, United Kingdom)
,
Mitrovic I.Z.
(Department of Electrical Engineering and Electronic, University of Liverpool, L69 3GJ, United Kingdom)
,
Hall S.
(Department of Electrical Engineering and Electronic, University of Liverpool, L69 3GJ, United Kingdom)
,
Wrench J.S.
(Centre for Advanced Materials, University of Liverpool, L69 3GH, United Kingdom)
,
Chalker P.R.
(Centre for Advanced Materials, University of Liverpool, L69 3GH, United Kingdom)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
178
ページ:
213-216
発行年:
2017年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)