文献
J-GLOBAL ID:201702268789179861
整理番号:17A0462170
ULSI配線のための先進的単一前駆体によるpSiCOH k=2.4
Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects
著者 (8件):
Priyadarshini Deepika
(IBM Research, Albany Nanotech, Albany, New York 12203)
,
Nguyen Son V.
(IBM Research, Albany Nanotech, Albany, New York 12203)
,
Shobha Hosadurga
(IBM Research, Albany Nanotech, Albany, New York 12203)
,
Liniger Eric
(IBM T.J. Watson Research Center, Yorktown Heights, New York 10598)
,
Chen James H.-C.
(IBM Research, Albany Nanotech, Albany, New York 12203)
,
Huang Huai
(IBM Research, Albany Nanotech, Albany, New York 12203)
,
Cohen Stephan A.
(IBM T.J. Watson Research Center, Yorktown Heights, New York 10598)
,
Grill Alfred
(IBM T.J. Watson Research Center, Yorktown Heights, New York 10598)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
35
号:
2
ページ:
021201-021201-6
発行年:
2017年03月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)