文献
J-GLOBAL ID:201702269415228478
整理番号:17A0365257
単分子層からの残留応力の予測多層膜【Powered by NICT】
Predicting multilayer film’s residual stress from its monolayers
著者 (6件):
Guo C.Q.
(Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China)
,
Pei Z.L.
(Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China)
,
Fan D.
(Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China)
,
Liu R.D.
(Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China)
,
Gong J.
(Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China)
,
Sun C.
(Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China)
資料名:
Materials & Design
(Materials & Design)
巻:
110
ページ:
858-864
発行年:
2016年
JST資料番号:
A0495B
ISSN:
0264-1275
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)