文献
J-GLOBAL ID:201702269946163373
整理番号:17A0450116
NEXAFS,RamanおよびTEMによる70keVのHeイオンを照射したCVD SiCの損傷挙動の研究【Powered by NICT】
Investigation of the damage behavior in CVD SiC irradiated with 70keV He ions by NEXAFS, Raman and TEM
著者 (7件):
Liu Min
(Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China)
,
Yang Xinmei
(Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China)
,
Gao Yantao
(Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China)
,
Liu Renduo
(Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China)
,
Huang Hefei
(Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China)
,
Zhou Xingtai
(Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China)
,
Sham T.K.
(Department of Chemistry and Soochow-Western Centre for Synchrotron Radiation Research, University of Western Ontario, London, Ontario, N6A5B7, Canada)
資料名:
Journal of the European Ceramic Society
(Journal of the European Ceramic Society)
巻:
37
号:
4
ページ:
1253-1259
発行年:
2017年
JST資料番号:
E0801B
ISSN:
0955-2219
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)