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J-GLOBAL ID:201702271632797930   整理番号:17A0313246

相変化メモリのための誘導結合BCl_3/Arプラズマ中の相変化材料GeTeのエッチング特性【Powered by NICT】

Etching characteristics of phase change material GeTe in inductively coupled BCl3/Ar plasma for phase change memory
著者 (30件):
Xia Yangyang
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Xia Yangyang
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Xia Yangyang
(University of the Chinese Academy of Sciences, Beijing 100049, China)
Liu Bo
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Liu Bo
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Wang Qing
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Wang Qing
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Wang Qing
(University of the Chinese Academy of Sciences, Beijing 100049, China)
Zhang Zhonghua
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Zhang Zhonghua
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Zhang Zhonghua
(University of the Chinese Academy of Sciences, Beijing 100049, China)
Li Shasha
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Li Shasha
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Li Shasha
(University of the Chinese Academy of Sciences, Beijing 100049, China)
Zheng Yonghui
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Zheng Yonghui
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Zheng Yonghui
(University of the Chinese Academy of Sciences, Beijing 100049, China)
Li Le
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Li Le
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Li Le
(University of the Chinese Academy of Sciences, Beijing 100049, China)
Song Sannian
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Song Sannian
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Yin Weijun
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Yin Weijun
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Yao Dongning
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Yao Dongning
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Song Zhitang
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Song Zhitang
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)
Feng Songlin
(State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China)
Feng Songlin
(Shanghai Key Laboratory of Nanofabrication Technology for Memory, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China)

資料名:
Microelectronic Engineering  (Microelectronic Engineering)

巻: 161  ページ: 69-73  発行年: 2016年08月01日 
JST資料番号: C0406B  ISSN: 0167-9317  CODEN: MIENEF  資料種別: 逐次刊行物 (A)
記事区分: 原著論文  発行国: オランダ (NLD)  言語: 英語 (EN)
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