文献
J-GLOBAL ID:201702272043088810
整理番号:17A1638990
金属支援化学エッチングにより作製したケイ素ナノワイヤアレイに基づいた反射防止サブ波長構造【Powered by NICT】
Antireflection subwavelength structures based on silicon nanowires arrays fabricated by metal-assisted chemical etching
著者 (9件):
Li Bin
(Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621000, China)
,
Li Bin
(College of Materials Science and Engineering, Southwest University of Science and Technology, Mianyang 621010, China)
,
Niu Gao
(Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621000, China)
,
Yi Yong
(College of Materials Science and Engineering, Southwest University of Science and Technology, Mianyang 621010, China)
,
Zhou Xiu-wen
(Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621000, China)
,
Liu Xu-dong
(Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621000, China)
,
Sun Lai-xi
(Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621000, China)
,
Wang Chao-yang
(Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621000, China)
,
Wang Chao-yang
(Science and Technology on Plasma Physics Laboratory, Mianyang 621000, China)
資料名:
Superlattices and Microstructures
(Superlattices and Microstructures)
巻:
111
ページ:
57-64
発行年:
2017年
JST資料番号:
D0600B
ISSN:
0749-6036
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)