文献
J-GLOBAL ID:201702272049774773
整理番号:17A0364020
熱白金薄膜の電気抵抗率に及ぼすイオンビーム散乱の影響【Powered by NICT】
Influence of ion beam scattering on the electrical resistivity of platinum hot films
著者 (7件):
Narasaki Masahiro
(Department of Aeronautics and Astronautics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
,
Narasaki Masahiro
(International Institute for Carbon-Neutral Energy Research (WPI-I2CNER), Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
,
Wang Haidong
(Department of Mechanical Engineering, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
,
Takata Yasuyuki
(International Institute for Carbon-Neutral Energy Research (WPI-I2CNER), Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
,
Takata Yasuyuki
(Department of Mechanical Engineering, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
,
Takahashi Koji
(Department of Aeronautics and Astronautics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
,
Takahashi Koji
(International Institute for Carbon-Neutral Energy Research (WPI-I2CNER), Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
166
ページ:
15-18
発行年:
2016年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)