文献
J-GLOBAL ID:201702274840783110
整理番号:17A0405516
原子層堆積により作製したV_2O_5陰極における電荷速度依存性応力と構造変化のin situ特性化【Powered by NICT】
In situ characterization of charge rate dependent stress and structure changes in V2O5 cathode prepared by atomic layer deposition
著者 (9件):
Jung Hyun
(MEMS Sensors and Actuators Laboratory (MSAL), University of Maryland, College Park, MD 20742, USA)
,
Jung Hyun
(Department of Electrical and Computer Engineering, University of Maryland, College Park, MD 20742, USA)
,
Jung Hyun
(Institute for Systems Research, University of Maryland, College Park, MD 20742, USA)
,
Gerasopoulos Konstantinos
(MEMS Sensors and Actuators Laboratory (MSAL), University of Maryland, College Park, MD 20742, USA)
,
Gerasopoulos Konstantinos
(Institute for Systems Research, University of Maryland, College Park, MD 20742, USA)
,
Talin A. Alec
(Sandia National Laboratories, Livermore, CA 94551, USA)
,
Ghodssi Reza
(MEMS Sensors and Actuators Laboratory (MSAL), University of Maryland, College Park, MD 20742, USA)
,
Ghodssi Reza
(Department of Electrical and Computer Engineering, University of Maryland, College Park, MD 20742, USA)
,
Ghodssi Reza
(Institute for Systems Research, University of Maryland, College Park, MD 20742, USA)
資料名:
Journal of Power Sources
(Journal of Power Sources)
巻:
340
ページ:
89-97
発行年:
2017年
JST資料番号:
B0703B
ISSN:
0378-7753
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)