文献
J-GLOBAL ID:201702275106980330
整理番号:17A0214349
サブ7nm技術ノードのための室温中性ビーム酸化による高性能相補GeピーキングFinFET【Powered by NICT】
High performance complementary Ge peaking FinFETs by room temperature neutral beam oxidation for sub-7 nm technology node applications
著者 (30件):
Lee Y.-J.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Hong T.-C.
(Dept. of Electrophysics, National Chiao Tung University, Hsinchu, Taiwan)
,
Hsueh F.-K.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Sung P.-J.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Chen C.-Y.
(Dept. of Electrical and Computer Engineering, National Chiao Tung University, Hsinchu, Taiwan)
,
Chuang S.-S.
(Dept. of Electronics Engineering & Institute of Electronics, National Chiao Tung University, Hsinchu, Taiwan)
,
Cho T.-C.
(Dept. of Electrophysics, National Chiao Tung University, Hsinchu, Taiwan)
,
Noda S.
(Institute of Fluid Science, Tohoku University, Sendai, Japan)
,
Tsou Y.-C.
(Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan)
,
Kao K.-H.
(Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan)
,
Wu C.-T.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Yu T.-Y.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Jian Y.-L.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Su C.-J.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Huang Y.-M.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Huang W.-H.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Chen B.-Y.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Chen M.-C.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Huang K.-P.
(Mechanical and Systems Research Laboratories, Industrial Technology Research Institute, Hsinchu, Taiwan)
,
Li J.-Y.
(Dept. of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan)
,
Chen M.-J.
(Dept. of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan)
,
Li Y.
(Dept. of Electrical and Computer Engineering, National Chiao Tung University, Hsinchu, Taiwan)
,
Samukawa S.
(Institute of Fluid Science, Tohoku University, Sendai, Japan)
,
Wu W.-F.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Huang G.-W.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Shieh J.-M.
(National Nano Device Laboratories, Hsinchu, Taiwan)
,
Tseng T.-Y.
(Dept. of Electrophysics, National Chiao Tung University, Hsinchu, Taiwan)
,
Chao T.-S.
(Dept. of Electrophysics, National Chiao Tung University, Hsinchu, Taiwan)
,
Wang Y.-H.
(Dept. of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan)
,
Yeh W.-K.
(National Nano Device Laboratories, Hsinchu, Taiwan)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2016
号:
IEDM
ページ:
33.5.1-33.5.4
発行年:
2016年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)