文献
J-GLOBAL ID:201702275673018361
整理番号:17A0151815
UVナノインプリントリソグラフィーにおける液滴径,液滴配置,ガス溶解がスループットおよび欠陥率に及ぼす影響
Effect of droplet size, droplet placement, and gas dissolution on throughput and defect rate in UV nanoimprint lithography
著者 (3件):
Jain Akhilesh
(McKetta Department of Chemical Engineering, The University of Texas at Austin, 200 E. Dean Keeton St. Stop C0400, Austin, Texas 78712-1589)
,
Spann Andrew
(McKetta Department of Chemical Engineering, The University of Texas at Austin, 200 E. Dean Keeton St. Stop C0400, Austin, Texas 78712-1589)
,
Bonnecaze Roger T.
(McKetta Department of Chemical Engineering, The University of Texas at Austin, 200 E. Dean Keeton St. Stop C0400, Austin, Texas 78712-1589)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
35
号:
1
ページ:
011602-011602-12
発行年:
2017年01月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)