文献
J-GLOBAL ID:201702277052932046
整理番号:17A1999986
化学機械研磨プロセスにおけるパッド調整性能劣化の研究【Powered by NICT】
Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process
著者 (9件):
Kim Hojoong
(Cleaning/CMP Technology Team, Memory Business, Samsung Electronics, Banwol-dong, Hwasung-si, Gyeonggi-do 445-701, Republic of Korea)
,
Hong Seokjun
(School of Mechanical Engineering, Sungkyunkwan University (SKKU), 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea)
,
Shin Cheolmin
(School of Mechanical Engineering, Sungkyunkwan University (SKKU), 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea)
,
Jin Yinhua
(SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University (SKKU), 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea)
,
Lim Dong Hyun
(Cleaning/CMP Technology Team, Memory Business, Samsung Electronics, Banwol-dong, Hwasung-si, Gyeonggi-do 445-701, Republic of Korea)
,
Kim Jun-yong
(Cleaning/CMP Technology Team, Memory Business, Samsung Electronics, Banwol-dong, Hwasung-si, Gyeonggi-do 445-701, Republic of Korea)
,
Hwang Hasub
(Cleaning/CMP Technology Team, Memory Business, Samsung Electronics, Banwol-dong, Hwasung-si, Gyeonggi-do 445-701, Republic of Korea)
,
Kim Taesung
(School of Mechanical Engineering, Sungkyunkwan University (SKKU), 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea)
,
Kim Taesung
(SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University (SKKU), 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea)
資料名:
Wear
(Wear)
巻:
392-393
ページ:
93-98
発行年:
2017年
JST資料番号:
E0377A
ISSN:
0043-1648
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)