文献
J-GLOBAL ID:201702278268340633
整理番号:17A0637772
白金触媒を用いた純水中の炭化ケイ素のウェットエッチング
Chemical etching of silicon carbide in pure water by using platinum catalyst
著者 (8件):
Isohashi Ai
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Bui P. V.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Toh D.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Matsuyama S.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Sano Y.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Inagaki K.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Morikawa Y.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
,
Yamauchi K.
(Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
110
号:
20
ページ:
201601-201601-4
発行年:
2017年05月15日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)