文献
J-GLOBAL ID:201702278881068303
整理番号:17A0445634
反応性ガスパルススパッタリングによって作製したTiN薄膜の構造と性質に及ぼすN_2ガス噴射パラメータの影響【Powered by NICT】
Effect of N2 gas injection parameters on structure and properties of TiN thin films prepared by reactive gas pulse sputtering
著者 (5件):
Yang Jijun
(Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, Sichuan, China)
,
Peng Mingjin
(Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, Sichuan, China)
,
Liao Jiali
(Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, Sichuan, China)
,
Yang Yuanyou
(Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, Sichuan, China)
,
Liu Ning
(Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, Sichuan, China)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
311
ページ:
391-397
発行年:
2017年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)