文献
J-GLOBAL ID:201702280157792996
整理番号:17A1716955
SrRuO_3エピタキシャル薄膜の成長モードに及ぼすex-situ原子間力顕微鏡観察【Powered by NICT】
Ex-situ atomic force microscopy on the growth mode of SrRuO3 epitaxial thin film
著者 (5件):
Kim Bora
(School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea)
,
Lee Sang A
(Department of Physics, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea)
,
Seol Daehee
(School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea)
,
Choi Woo Seok
(Department of Physics, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea)
,
Kim Yunseok
(School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea)
資料名:
Current Applied Physics
(Current Applied Physics)
巻:
17
号:
12
ページ:
1721-1726
発行年:
2017年
JST資料番号:
W1579A
ISSN:
1567-1739
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)