文献
J-GLOBAL ID:201702280238886428
整理番号:17A0151789
ネガ型フォトリソグラフィー用の透明で可視非感光性アクリルフォトレジス
Transparent and visible light-insensitive acrylic photoresist for negative tone optical lithography
著者 (3件):
Carbaugh Daniel J.
(School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology, Ohio University, Athens, Ohio 45701)
,
Kaya Savas
(School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology, Ohio University, Athens, Ohio 45701)
,
Rahman Faiz
(School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology, Ohio University, Athens, Ohio 45701)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
35
号:
1
ページ:
011601-011601-8
発行年:
2017年01月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)