文献
J-GLOBAL ID:201702280466243164
整理番号:17A0445629
裸及びシリコンで被覆されたベリリウム膜の表面粗さに及ぼすイオンビームエッチングの効果【Powered by NICT】
Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films
著者 (10件):
Chkhalo N.I.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
,
Mikhailenko M.S.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
,
Mil’kov A.V.
(“Compozit”, Pionerskaya Str. 4, 141070, Moscow Region, Korolev, Russia)
,
Pestov A.E.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
,
Polkovnikov V.N.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
,
Polkovnikov V.N.
(N.I. Lobachevsky Nizhegorodsky State University, Gagarina Av., 23, 603950 Nizhny Novgorod, Russia)
,
Salashchenko N.N.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
,
Strulya I.L.
(“Compozit”, Pionerskaya Str. 4, 141070, Moscow Region, Korolev, Russia)
,
Zorina M.V.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
,
Zuev S.Yu.
(Institute for Physics of Microstructures RAS, GSP-105, 603910 Nizhny Novgorod, Russia)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
311
ページ:
351-356
発行年:
2017年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)