文献
J-GLOBAL ID:201702280646390459
整理番号:17A1834133
フォトニックデバイストリミングのためのシリコンへのイオン注入【Powered by NICT】
Ion implantation in silicon for photonic device trimming
著者 (7件):
Milosevic Milan M.
(Optoelectronics Research Centre, University of Southampton Southampton, United Kingdom)
,
Chen Xia
(Optoelectronics Research Centre, University of Southampton Southampton, United Kingdom)
,
Cao Wei
(Optoelectronics Research Centre, University of Southampton Southampton, United Kingdom)
,
Thomson David J.
(Optoelectronics Research Centre, University of Southampton Southampton, United Kingdom)
,
Reed Graham T.
(Optoelectronics Research Centre, University of Southampton Southampton, United Kingdom)
,
Littlejohns Callum G.
(Silicon Centre of Excellence, Nanyang Technological University, Singapore, Singapore)
,
Wang Hong
(Silicon Centre of Excellence, Nanyang Technological University, Singapore, Singapore)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
CLEO-PR
ページ:
1-2
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)