文献
J-GLOBAL ID:201702284820509863
整理番号:17A0386061
シリコン(111)面上の緩和したアルミニウム単結晶の変成成長
Metamorphic growth of relaxed single crystalline aluminum on silicon (111)
著者 (6件):
McSkimming Brian M.
(Laboratory for Physical Sciences, University of Maryland, 8050 Greenmead Dr., College Park, Maryland 20740)
,
Alexander Ashish
(Laboratory for Physical Sciences, University of Maryland, 8050 Greenmead Dr., College Park, Maryland 20740)
,
Samuels Margaret H.
(Laboratory for Physical Sciences, University of Maryland, 8050 Greenmead Dr., College Park, Maryland 20740)
,
Arey Bruce
(Pacific Northwest National Laboratory, Richland, Washington 99352)
,
Arslan Ilke
(Pacific Northwest National Laboratory, Richland, Washington 99352)
,
Richardson Christopher J. K.
(Laboratory for Physical Sciences, University of Maryland, 8050 Greenmead Dr., College Park, Maryland 20740)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
35
号:
2
ページ:
021401-021401-6
発行年:
2017年03月
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)