文献
J-GLOBAL ID:201702285112104791
整理番号:17A0698252
効果的な水素発生反応のためのプラズマエッチ,Sドープグラフェン【Powered by NICT】
Plasma-etched, S-doped graphene for effective hydrogen evolution reaction
著者 (6件):
Tian Ye
(College of Science, Hebei North University, Zhangjiakou 075000, Hebei, China)
,
Wei Zhen
(College of Science, Hebei North University, Zhangjiakou 075000, Hebei, China)
,
Wang Xuejun
(College of Science, Hebei North University, Zhangjiakou 075000, Hebei, China)
,
Peng Shuo
(College of Information Science and Engineering, Hebei North University, Zhangjiakou 075000, Hebei, China)
,
Zhang Xiao
(College of Information Science and Engineering, Hebei North University, Zhangjiakou 075000, Hebei, China)
,
Liu Wu-ming
(Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China)
資料名:
International Journal of Hydrogen Energy
(International Journal of Hydrogen Energy)
巻:
42
号:
7
ページ:
4184-4192
発行年:
2017年
JST資料番号:
B0192B
ISSN:
0360-3199
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)