文献
J-GLOBAL ID:201702286500682887
整理番号:17A0444970
種なし拡散障壁材料としてのコバルトタングステン合金中のタングステン添加の影響【Powered by NICT】
Effect of tungsten incorporation in cobalt tungsten alloys as seedless diffusion barrier materials
著者 (8件):
Su Yin-Hsien
(Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan, ROC)
,
Kuo Tai-Chen
(Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan, ROC)
,
Lee Wen-Hsi
(Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan, ROC)
,
Wang Yu-Sheng
(Institute of Lighting and Energy Photonics, National Chiao Tung University, Hsinchu, Taiwan, ROC)
,
Hung Chi-Cheng
(Institute of Lighting and Energy Photonics, National Chiao Tung University, Hsinchu, Taiwan, ROC)
,
Tseng Wei-Hsiang
(Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan, ROC)
,
Wei Kuo-Hsiu
(Department of Material Science and Engineering, National Cheng Kung University, Tainan, Taiwan, ROC)
,
Wang Ying-Lang
(Institute of Lighting and Energy Photonics, National Chiao Tung University, Hsinchu, Taiwan, ROC)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
171
ページ:
25-30
発行年:
2017年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)