文献
J-GLOBAL ID:201702286565558131
整理番号:17A1708006
シンクロトロンベースのX線光電子分光法により特性評価したCH_3NH_3PbI_3上の室温原子層堆積したAl_2O_3【Powered by NICT】
Room temperature atomic layer deposited Al2O3 on CH3NH3PbI3 characterized by synchrotron-based X-ray photoelectron spectroscopy
著者 (6件):
Kot Malgorzata
(Brandenburg University of Technology Cottbus-Senftenberg, Konrad-Wachsmann-Allee 17, 03046 Cottbus, Germany)
,
Das Chittaranjan
(Brandenburg University of Technology Cottbus-Senftenberg, Konrad-Wachsmann-Allee 17, 03046 Cottbus, Germany)
,
Henkel Karsten
(Brandenburg University of Technology Cottbus-Senftenberg, Konrad-Wachsmann-Allee 17, 03046 Cottbus, Germany)
,
Wojciechowski Konrad
(Clarendon Laboratory, University of Oxford, Parks Road, Oxford OX13PU, United Kingdom)
,
Snaith Henry J.
(Clarendon Laboratory, University of Oxford, Parks Road, Oxford OX13PU, United Kingdom)
,
Schmeisser Dieter
(Brandenburg University of Technology Cottbus-Senftenberg, Konrad-Wachsmann-Allee 17, 03046 Cottbus, Germany)
資料名:
Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms
(Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms)
巻:
411
ページ:
49-52
発行年:
2017年
JST資料番号:
H0899A
ISSN:
0168-583X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)