文献
J-GLOBAL ID:201702287824783164
整理番号:17A0444958
より良い欠陥性能と促進ポストCMPクリーニングを用いた障壁スラリーの研究【Powered by NICT】
Investigation of the barrier slurry with better defect performance and facilitating post-CMP cleaning
著者 (9件):
Luan Xiaodong
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
,
Luan Xiaodong
(Tianjin Key Laboratory of Electronic Materials and the Devices, School of Electronic Information Engineering, Hebei University of Technology, Tianjin 300130, China)
,
Liu Yuling
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
,
Liu Yuling
(Tianjin Key Laboratory of Electronic Materials and the Devices, School of Electronic Information Engineering, Hebei University of Technology, Tianjin 300130, China)
,
Zhang Baoguo
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
,
Wang Shengli
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
,
Niu Xinhuan
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
,
Wang Chenwei
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
,
Wang Juan
(Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
170
ページ:
21-28
発行年:
2017年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)