文献
J-GLOBAL ID:201702287844043621
整理番号:17A0443043
反応性マグネトロンスパッタリングにより作製したタングステン亜窒化薄膜の熱安定性【Powered by NICT】
Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering
著者 (8件):
Zhang X.X.
(School of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou, 730050, PR China)
,
Zhang X.X.
(State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730050, PR China)
,
Wu Y.Z.
(School of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou, 730050, PR China)
,
Mu B.
(College of Petrochemical Technology, Lanzhou University of Technology, Lanzhou, 730050, PR China)
,
Qiao L.
(State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730050, PR China)
,
Li W.X.
(Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, PR China)
,
Li J.J.
(Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, PR China)
,
Wang P.
(State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730050, PR China)
資料名:
Journal of Nuclear Materials
(Journal of Nuclear Materials)
巻:
485
ページ:
1-7
発行年:
2017年
JST資料番号:
D0148A
ISSN:
0022-3115
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)