文献
J-GLOBAL ID:201702289989767753
整理番号:17A0749480
分子薄膜の直接光配向と光パターニング【Powered by NICT】
Direct Photoalignment and Optical Patterning of Molecular Thin Films
著者 (9件):
Pithan Linus
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
,
Beyer Paul
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
,
Bogula Laura
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
,
Zykov Anton
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
,
Schaefer Peter
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
,
Rawle Jonathan
(Diamond Light Source Ltd, Harwell Science & Innovation Campus, Didcot, Oxfordshire, OX11 0DE, UK)
,
Nicklin Chris
(Diamond Light Source Ltd, Harwell Science & Innovation Campus, Didcot, Oxfordshire, OX11 0DE, UK)
,
Opitz Andreas
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
,
Kowarik Stefan
(Institut fuer Physik, Humboldt-Universitaet zu Berlin, Newtonstr. 15, 12489, Berlin, Germany)
資料名:
Advanced Materials
(Advanced Materials)
巻:
29
号:
6
ページ:
ROMBUNNO.201604382
発行年:
2017年
JST資料番号:
W0001A
ISSN:
0935-9648
CODEN:
ADVMEW
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)