文献
J-GLOBAL ID:201702290734592376
整理番号:17A1641112
溶液処理ジルコニウム酸化物ゲート誘電体を有するpチャネル一酸化スズトランジスタの性能改善【Powered by NICT】
Performance Improvement of p-Channel Tin Monoxide Transistors With a Solution-Processed Zirconium Oxide Gate Dielectric
著者 (5件):
Azmi Azida
(Department of Materials Science and Engineering, Inha University, Incheon, South Korea)
,
Lee Jiwon
(Department of Electronic Engineering, Hanyang University, Seoul, South Korea)
,
Gim Tae Jung
(Department of Electronic Engineering, Hanyang University, Seoul, South Korea)
,
Choi Rino
(Department of Materials Science and Engineering, Inha University, Incheon, South Korea)
,
Jeong Jae Kyeong
(Department of Electronic Engineering, Hanyang University, Seoul, South Korea)
資料名:
IEEE Electron Device Letters
(IEEE Electron Device Letters)
巻:
38
号:
11
ページ:
1543-1546
発行年:
2017年
JST資料番号:
B0344B
ISSN:
0741-3106
CODEN:
EDLEDZ
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)