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J-GLOBAL ID:201702291056198657
整理番号:17A0214335
信頼性と性能同時最適化を考慮したトンネルFETにおける絶縁破壊への深い洞察【Powered by NICT】
Deep insights into dielectric breakdown in tunnel FETs with awareness of reliability and performance co-optimization
著者 (16件):
Huang Qianqian
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Jia Rundong
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Zhu Jiadi
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Lv Zhu
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Wang Jiaxin
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Chen Cheng
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Zhao Yang
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Wang Runsheng
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Bu Weihai
(Semiconductor Manufacturing International Corporation (SMIC), Shanghai 201203 and Beijing 100176, China)
,
Wang Wenbo
(Semiconductor Manufacturing International Corporation (SMIC), Shanghai 201203 and Beijing 100176, China)
,
Kang Jin
(Semiconductor Manufacturing International Corporation (SMIC), Shanghai 201203 and Beijing 100176, China)
,
Hua Kelu
(Semiconductor Manufacturing International Corporation (SMIC), Shanghai 201203 and Beijing 100176, China)
,
Wu Hanming
(Semiconductor Manufacturing International Corporation (SMIC), Shanghai 201203 and Beijing 100176, China)
,
Yu Shaofeng
(Semiconductor Manufacturing International Corporation (SMIC), Shanghai 201203 and Beijing 100176, China)
,
Wang Yangyuan
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
,
Huang Ru
(Key Laboratory of Microelectronic Devices and Circuits (MOE), Institute of Microelectronics, Peking University, Beijing 100871, China)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2016
号:
IEDM
ページ:
31.5.1-31.5.4
発行年:
2016年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)