文献
J-GLOBAL ID:201702291246327433
整理番号:17A0471637
テトラキス(ジメチルアミノ)チタンとH_2O前駆体を用いた原子層蒸着による共形原子層TiO_2のウエハスケール作製【Powered by NICT】
Wafer-scale fabrication of conformal atomic-layered TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium and H2O precursors
著者 (6件):
Zhuiykov Serge
(Ghent University Global Campus, 119 Songdomunhwa-ro, Yeonsu-gu, Incheon, South Korea)
,
Akbari Mohammad Karbalaei
(Ghent University Global Campus, 119 Songdomunhwa-ro, Yeonsu-gu, Incheon, South Korea)
,
Hai Zhenyin
(Ghent University Global Campus, 119 Songdomunhwa-ro, Yeonsu-gu, Incheon, South Korea)
,
Xue Chenyang
(Key Laboratory of Instrumentation Science and Dynamic Measurement of Ministry of Education, North University of China, 030051, PR China)
,
Xu Hongyan
(School of Materials Science and Engineering, North University of China, 030051, PR China)
,
Hyde Lachlan
(Melbourne Center For Nanofabrication, 151 Wellington Road, Clayton, VIC 3168, Australia)
資料名:
Materials & Design
(Materials & Design)
巻:
120
ページ:
99-108
発行年:
2017年
JST資料番号:
A0495B
ISSN:
0264-1275
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)