文献
J-GLOBAL ID:201702294778849272
整理番号:17A1721706
電子ビーム処理した二酸化チタンの薄膜によるシリコン表面の優れた不動態化【Powered by NICT】
Excellent Passivation of Silicon Surfaces by Thin Films of Electron-Beam-Processed Titanium Dioxide
著者 (8件):
Ling Zhaoheng
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
,
He Jian
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
,
He Xiaoyong
(Department of Physics, Mathematics and Science College, Shanghai Normal University, Shanghai, China)
,
Liao Mingdun
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
,
Liu Peipei
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
,
Yang Zhenhai
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
,
Ye Jichun
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
,
Gao Pingqi
(Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo, China)
資料名:
IEEE Journal of Photovoltaics
(IEEE Journal of Photovoltaics)
巻:
7
号:
6
ページ:
1551-1555
発行年:
2017年
JST資料番号:
W2305A
ISSN:
2156-3381
CODEN:
IJPEG8
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)