文献
J-GLOBAL ID:201802214194405930
整理番号:18A1614432
Ge(100)修飾基板上に熱蒸着したBaSi_2薄膜の作製と特性評価【JST・京大機械翻訳】
Fabrication and properties characterization of BaSi2 thin-films thermally-evaporated on Ge (100) modified substrates
著者 (6件):
Lien Mai Thi Kieu
(Venture Business Laboratory, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan)
,
Lien Mai Thi Kieu
(Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan)
,
Lien Mai Thi Kieu
(University of Science and Education, The University of Danang, 459 Ton Duc Thang, Hoa Khanh Nam, Lien Chieu, Da Nang, Vietnam)
,
Nakagawa Yoshihiko
(Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan)
,
Kurokawa Yasuyoshi
(Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan)
,
Usami Noritaka
(Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
663
ページ:
14-20
発行年:
2018年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)